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MACHINES FOR RENT - STANDARD PLASMA SYSTEMS

 

[ PLASMA ETCHER NANO UHP]

   
  The plasma system Nano UHP with 18 litres chamber volume and semi-automatic control is mainly used for:
  • small scale production
  • analysis (SEM, TEM)
  • electronic technology
  • medical technology
  • plastics technology
  • elastomer technology
  • research and development

The plasma system NANO UHP doesn't have a stainless steel chamber thus it is suitable for applications in which vestiges of chrome, nickel and iron are inconveniant.

   
   
 
 

Technical Data:
Plasma etcher NANO UHP

switchgear cabinet:
W 580 mm, H 650 mm, D 600 mm
chamber:
Ø 240 mm, L 400 mm
(optional: L 600 mm)
materials: quartz or borosilicate glass
front-and backside of the chamber: aluminium
chamber volume:
approx. 18 litres
gas supply:
two gas channels through needle valve
generator:
40kHz/300 W, infinitely variable
(optional: 13.56 MHz or 2.45 GHz)
vacuum pump:
Leybold, Type D8B (8 m³/h)
trays:

1 pc. tray
control:
semi-automatic, process time by timer

Options / accessories

 
NANO UHP with semi-automatic control

Plasma system NANO UHP with semi-automatic control: cleaning, activating, etching, deposition of coatings
   
   
  Please contact us if you have technical questions.
   
   
   
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