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STANDARD PLASMA SYSTEMS

 

[ RF-GENERATORS ]

   
 

A generator is required in order for a plasma unit to function. Which frequency is the best for the desired application of plasmas, must be determined on a case by case basis. 
After years of Diener working with and offering plasma generators with frequencies of 40kHz and 2.45 GHz, now the specially developed 13.56 MHz generators with 100 and 300 Watts are also available.

   
 

Advantages of the 13.56 MHz-Generator:

  1. Homogeneity is better than with the 2.45 GHz
  2. Etching rate is higher with same output compared to the 40 kHz
  3. Suitable for Front- and Back-End Semiconductor processes,as with the GHz
  4. High coating rates with plasma polymerization processes


 

Beneficial Features offered by Diener

It is possible for the 13.56 MHz generators with either output (100 W or 300 W) to be used for all main plasma applications, activation, cleaning, etching, Front-and-Back-End Semiconductor processing, and polymerization. 
Impedance adjustment of the capacitors must be controlled manually (handmatching) or automatically (automatching) to achieve impedance matching.  Impedance matching between the generator and the chamber is necessary for optimum plasma energy efficiency while using this type of generator. 
A display of the return energy during the manual impedance matching process is given to ensure your unit is adjusting properly.
Another feature offered by Diener is symmetrical set up of electrodes in the chamber for uniform plasma treatment.  This ensures all parts achieve the same results.

 

 
 
 
  Please contact us for details and questions you have.
   
   
   
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