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Principle of plasma process
A vacuum is generated in a recipient with the aid of a vacuum pump. At a pressure of approx. 0,1 mbar process gas is introduced into the chamber. The generator is switched on and the process gas is ionised in the recipient. The material is exposed to the plasma. Fresh process gas is supplied continuously to the plasma process and contaminated gas is extracted. After treatment times which are as a rule between 1-30 min., the chamber is vented and the material treated is removed.
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